updated by Xiaoyu 09.14.2023
- Check all the temperature settings
(Inner Heater : 250 deg. C, Outer Heater : 200 deg. C, Precursor Manifold : 150 deg. C, Stop Valve : 150 deg. C , Trap/Pump : 100 deg. C )
- Change "Inner Heater" temperature as 200 deg. C (If you don`t set this temperature at the beginning, you should wait more than 20 min to get to 250 deg. C)
- Check the temperature of "Hf Precursor Jackets"
- Click the Process tab
- Click the 'VENT' button
- Change the number from '20' to '100' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard
- Turn off the Vacuum pump
- Close the cabinet
* Do not use photoresist material
* Just use metal tweezer! not teflon tweezer
- Venting process is done when Guage Pressure is reached to 7.40E+2 Torr
- You can see the stabilized pressure in the real-time Pressure display
- Open the cage
- Open the chamber with clean wiper
* Chamber is very hot so use clean wiper when you grab the chamber
- Load your samples on the center of chamber
- Close the chamber with clean wiper
* Make sure nothing is on the chamber lid
- Change the number from '100' to '20' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard
- Turn on the Vacuum pump
- Click the "PUMP" button
- Pump process is done when Guage Pressure is reached to ~1.3E-1 Torr
- Open cabinet
- Open precursor valve (Al valve (#1)) all the way left (valve vertical -> vent; valve horizontal -> close)
* Water valve (#0) is always open
- Right click the rectangular and select the recipe you want in Neal Hall folder
- Change the recipe as you want
* "goto" row defines how many cycles you want to deposit Al2O3
* Set the proper number of cycles (typically it should be 1 ~ 1.2Å/cycle - So… around 2000 cycles mean approximately 220 nm
- Click the 'START' button
- Click the "Yes" when the massage pops up
- Close Al Valve (#1) all the way right (clock wise)
- Change the number from '20' to '100' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard
- Click the 'VENT' button
- Open the cabinet underneath the ALD chamber
- Turn off the Vacuum pump
- Close the cabinet
- Open the cage
- Open the chamber with clean wiper
- Unload your wafer with metal tweezer
- Close the chamber with clean wiper
- Close the cage
- Open the cabinet
- Turn on the Vacuum pump
- Close the cabinet
- Change the number from '100' to '20' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard
- Click the "PUMP" button
- Change "Inner Heater" temperature as 250 deg. C
You can leave noe :)