ALD Banerjee

updated by Xiaoyu 09.14.2023

checking the tool

 - Check all the temperature settings

   (Inner Heater : 250 deg. C, Outer Heater : 200 deg.  C, Precursor Manifold : 150 deg. C, Stop Valve : 150 deg. C  , Trap/Pump : 100 deg. C  )

 - Change "Inner Heater" temperature as 200 deg. C (If you don`t set this temperature at the beginning, you should wait more than 20 min to get to 250 deg. C)

 - Check the temperature of "Hf Precursor Jackets"

Venting the chamber

 - Click the Process tab

 - Click the 'VENT' button

 - Change the number from '20' to '100' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard

 - Turn off the Vacuum pump

 - Close the cabinet

   * Do not use photoresist material

   * Just use metal tweezer! not teflon tweezer

 - Venting process is done when Guage Pressure is reached to 7.40E+2 Torr

 - You can see the stabilized pressure in the real-time Pressure display

Loading samples

- Open the cage

 - Open the chamber with clean wiper

   * Chamber is very hot so use clean wiper when you grab the chamber

 - Load your samples on the center of chamber

 - Close the chamber with clean wiper

  * Make sure nothing is on the chamber lid

 - Change the number from '100' to '20' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard

 - Turn on the Vacuum pump

 - Click the "PUMP" button

 - Pump process is done when Guage Pressure is reached to ~1.3E-1 Torr

Starting the process

 - Open cabinet

 - Open precursor valve (Al valve (#1)) all the way left (valve vertical -> vent; valve horizontal -> close)

   * Water valve (#0) is always open

 - Right click the rectangular and select the recipe you want in Neal Hall folder

 - Change the recipe as you want

    * "goto" row defines how many cycles you want to deposit Al2O3

    * Set the proper number of cycles (typically it should be 1 ~ 1.2Å/cycle - So… around 2000 cycles mean approximately 220 nm

 - Click the 'START' button

 - Click the "Yes" when the massage pops up

Unloading samples

 - Close Al Valve (#1) all the way right (clock wise)

 - Change the number from '20' to '100' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard

 - Click the 'VENT' button

 - Open the cabinet underneath the ALD chamber

 - Turn off the Vacuum pump

 - Close the cabinet

 - Open the cage

 - Open the chamber with clean wiper

 - Unload your wafer with metal tweezer

 - Close the chamber with clean wiper

 - Close the cage

Finalizing the process

 - Open the cabinet

 - Turn on the Vacuum pump

 - Close the cabinet

 - Change the number from '100' to '20' in '0 N2 Carrier (sccm)' box and Push Enter button on a keyboard

 - Click the "PUMP" button

 - Change "Inner Heater" temperature as 250 deg. C

You can leave noe :)