AZ5214 Photolithography

1.AMI clean

2.HMDS Prime

3.Spin-coating

• 3000 rpm->30s

• 1.6 um thickness

4.Prebake

• 110 deg.C -> 50s

5.Exposure

• vaccum

• 20 um seperation

• pre vac: 10 sec, full vac: 30 sec, vac purge: 10 sec

• continous WEC

6.Development

• AZ400K : water = 1 (50 ml) : 4 (200 ml), 25 sec – 35 sec. For Yoonho, 28 sec is the gold time. plenty of agitation.

• AZ400K : water = 1 (50 ml) : 6 (300 ml), 65 sec – 75 sec. plenty of agitation.

7.March Asher – to remove any PR residue (mild residue)

• Run March Asher for 30 secs

  • Double check the time of the March Asher.